Author Affiliations
Abstract
1 Centre for Optical and Electromagnetic Research, Zhejiang University, Joint Research Center of Photonics of the Royal Institute of Technology and Zhejiang University (JORCEP), Hangzhou 310058
2 The Institute of Information Optical Engineering, Soochow University, Suzhou 215006
This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers.
光刻技术 银膜超级透镜 PMMA 220.3740 Lithography 080.3630 Lenses Chinese Optics Letters
2008, 6(2): 02149
